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US 2022/0019724 A1Published application
System and method for performing process model calibration in a virtual semiconductor device fabrication environment
AssigneeCoventor, Inc.
InventorsWilliam Egan, Kenneth B. Greiner, David M. Fried, Anshuman Kunwar
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Abstract
A virtual fabrication environment for semiconductor device fabrication that includes an analytics module for performing key parameter identification, process model calibration and variability analysis is discussed.
Claims20
A non-transitory computer-readable medium holding computing device-executable instructions for process model calibration, the instructions when executed causing at least one computing device equipped with at least one processor to:
- perform in a virtual fabrication environment a plurality of virtual fabrication runs for a semiconductor device based on a Design of Experiment (DOE) using 2D design data and a process sequence, the plurality of virtual fabrication runs building a plurality of 3D models;
- receive a user identification of one or more targets for the plurality of 3D models;
- receive, via a user interface in the virtual fabrication environment, a user selection of desired values for selected targets associated with one or more key parameters whose value affects measurement data for the one or more targets;
- receive a user selection of upper and lower bounds for each identified key parameter via the user interface in the virtual fabrication environment;
- execute an optimization algorithm for the plurality of 3D models using the key parameters, desired values and upper and lower bounds;
- and
- display or export results from the optimization algorithm.
4 more elements
A computing device-implemented method for process model calibration, comprising:
- performing in a virtual fabrication environment a plurality of virtual fabrication runs for a semiconductor device based on a Design of Experiment (DOE) using 2D design data and a process sequence, the plurality of virtual fabrication runs building a plurality of 3D models;
- receiving a user identification of one or more targets for the plurality of 3D models;
- receiving, via a user interface in the virtual fabrication environment, a user selection of desired values for selected targets associated with one or more key parameters whose value affects measurement data for the one or more targets;
- receiving a user selection of upper and lower bounds for each identified key parameter via the user interface in the virtual fabrication environment;
- executing an optimization algorithm for the plurality of 3D models using the key parameters, desired values and upper and lower bounds;
- and
- displaying or exporting results from the optimization algorithm.
4 more elements
A virtual fabrication system, comprising:
- a computing device equipped with a processor and configured to generate a virtual fabrication environment, the virtual fabrication environment:
- performing a plurality of virtual fabrication runs for a semiconductor device based on a Design of Experiment (DOE) using 2D design data and a process sequence, the plurality of virtual fabrication runs building a plurality of 3D models,
- receiving a user identification of one or more targets for the plurality of 3D models,
- receiving, via a user interface provided by the virtual fabrication environment, a user selection of desired values for selected targets associated with one or more key parameters whose value affects measurement data for the one or more targets,
- receiving a user selection of upper and lower bounds for each identified key parameter via the user interface,
- executing an optimization algorithm for the plurality of 3D models using the key parameters, desired values and upper and lower bounds, and
- displaying or exporting results from the optimization algorithm;
- and
- a display surface in communication with the computing device, the display surface configured to display one or more of the plurality of 3D models in a 3D view.
6 more elements
Dependencies are inferred from the claim text.