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US 2022/0018790 A1Published application
Abnormality detecting method and abnormality detecting apparatus
AssigneeTokyo Electron Limited
InventorYuka NAKASATO
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Abstract
An abnormality detecting method includes: generating substrate information that represents a relationship between an in-plane position of a substrate processed in a semiconductor manufacturing apparatus and a film characteristic; and determining whether the film characteristic of the processed substrate is abnormal, based on the substrate information generated in the generating, and association information in which substrate information and abnormality factors are associated with each other.
Claims16
An abnormality detecting method comprising:
- generating substrate information that represents a relationship between an in-plane position of a substrate processed in a semiconductor manufacturing apparatus and a film characteristic;
- and
- determining whether the film characteristic of the processed substrate is abnormal, based on the substrate information generated in the generating, and association information in which substrate information and abnormality factors are associated with each other.
An abnormality detecting apparatus comprising:
- a memory;
- and
- a processor coupled to the memory and configured to:
- generate substrate information that represents a relationship between an in-plane position of a substrate processed in a semiconductor manufacturing apparatus and a film characteristic;
- store the substrate information, and association information in which substrate information and abnormality factors are associated with each other to the memory;
- and
- determine whether the film characteristic of the processed substrate is abnormal, based on the substrate information and the association information stored in the memory.
4 more elements
Dependencies are inferred from the claim text.