Substrate processing chamber and process gas flow deflector for use in the processing chamber

A processing chamber for processing a substrate, comprising:

• a chamber body defining an interior substrate processing region;
• a substrate support configured to hold a substrate in place;
• a pre-heat ring having a central opening sized to be disposed around the substrate to be placed on the substrate support;
• a process gas inlet configured to direct process gas in a lateral direction to flow over the pre-heat ring and over the substrate to be placed on the substrate support;
• a process gas outlet arranged opposite the process gas inlet;
• and
• a process gas flow deflector comprising a radially outer mounting portion and a radially inner blade-shaped process gas deflection portion extending in a radial direction,
• wherein the radially inner blade-shaped process gas deflection portion is shaped as a ring segment,
• wherein the radially inner blade-shaped process gas deflection portion is disposed above the process gas inlet and dimensioned to overlap with the pre-heat ring, and
• wherein a degree of overlap between the pre-heat ring and the process gas flow deflector in the radial direction is at least ½ of the radial dimension of the pre-heat ring.