Semiconductor device and manufacturing method thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMauricio MANFRINI, Chung-Te Lin, Ken-Ichi Goto
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMauricio MANFRINI, Chung-Te Lin, Ken-Ichi Goto
Estimating the term…
A semiconductor device includes a semiconductor substrate and an interconnection region disposed on the semiconductor substrate. The interconnection region includes stacked metallization levels, a magnetic tunnel junction, and a transistor. The magnetic tunnel junction is formed on a first conductive pattern of a first metallization level of the stacked metallization levels. The transistor is formed on a second conductive pattern of a second metallization level of the stacked metallization levels. The transistor is a vertical gate-all-around transistor. A drain contact of the transistor is electrically connected to the magnetic tunnel junction by the first conductive pattern of the first metallization level. The second metallization level is closer to the semiconductor substrate than the first metallization level.
A semiconductor device, comprising:
A semiconductor device, comprising:
A manufacturing method of a semiconductor device, comprising:
Dependencies are inferred from the claim text.