Apparatus for transferring substrate, and apparatus and method for treating substrate
AssigneeSemes Co., Ltd.
InventorsJINWOO JUNG, YONG HEE LEE
Life of this patent
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AssigneeSemes Co., Ltd.
InventorsJINWOO JUNG, YONG HEE LEE
Estimating the term…
An apparatus for treating a substrate is provided. The apparatus for treating the substrate includes a first process chamber to perform a liquid treatment process with respect to the substrate, a second process chamber to perform a drying treatment process with respect to the substrate which is liquid treated in the first process chamber, a first hand to introduce the substrate to the first process chamber, before the liquid treatment process is performed, a second hand to withdraw the substrate from the first process chamber after the liquid treatment process is performed and to introduce the substrate into the second process chamber, and a third hand to withdraw the substrate from the second process chamber after the drying treatment process is performed.
An apparatus for treating a substrate, the apparatus comprising:
An apparatus for transferring a substrate, the apparatus comprising:
An apparatus for treating a substrate, the apparatus comprising:
-20. (canceled)
Dependencies are inferred from the claim text.