Salt, acid generator, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsKatsuhiro KOMURO, Koji ICHIKAWA
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AssigneeSumitomo Chemical Company, Limited
InventorsKatsuhiro KOMURO, Koji ICHIKAWA
Estimating the term…
A salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10, —O-L1-CO—O—R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents an acid-labile group; X1, X2 and X3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, etc.; and AI− represents an organic anion.
A salt represented by formula (I):
Dependencies are inferred from the claim text.