Hydrogen permeation barrier coatings and methods of making the same

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A method of coating a substrate comprising:

• depositing a hydrogen permeation barrier coating onto a substrate via atomic layer deposition (ALD), wherein the depositing comprises 1 or more deposition cycles of at least a first precursor and separately one or more deposition cycles of at least a second precursor such that alternating layers resulting from the first precursor deposition and the second precursor deposition are formed on the substrate, and each cycle of the first and second precursors comprises a pulse time of about 0.1 seconds to 20 seconds, a purge time of about 5 seconds to about 60 seconds, and a deposition temperature in a range of about 150° C. to about 400° C.

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A method of forming a hydrogen permeation barrier coating on a substrate comprising:

• depositing a ceramic layer onto the substrate;
• depositing a metal layer onto the ceramic layer,
• repeating alternatingly the depositing of the ceramic layer and the metal layer, wherein each depositing under conditions sufficient to form a respective one of the ceramic or metal layers having a microstructure comprising nanocrystalline and/or equiaxed grains.