Dielectric film, method for producing same and optical member using same
AssigneeKonica Minolta, Inc.
InventorsJinichi KASUYA, Kazunari TADA
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Abstract
A dielectric film is provided on a transparent substrate. The dielectric film has at least one low refractive index layer. An uppermost layer of the dielectric film contains SiO2 and has a film density of 92% or more. The uppermost layer contains an element having an electronegativity smaller than Si.
Claims12
A dielectric film provided on a transparent substrate, wherein the dielectric film has at least one low refractive index layer, and an uppermost layer of the dielectric film contains SiO2 and has a film density of 92% or more, and the uppermost layer contains an element having an electronegativity smaller than Si.
A method of producing a dielectric film provided on a transparent substrate, comprising the steps of:
- forming at least one low refractive index layer;
- and forming an uppermost layer containing SiO2 and an element selected from the group consisting of sodium, calcium, potassium, and magnesium.
Dependencies are inferred from the claim text.