Apparatus for correcting impact point of ink and system for treating substrate with the apparatus

An apparatus for correcting an impact point of ink comprising:

• a recognition unit for acquiring information on an impact point of ink at a plurality of points located on a substrate;
• and
• a correction unit for correcting a position of an ink discharge point on the substrate based on the information on the impact point,
• wherein the correction unit, when there are a plurality of cell areas on the substrate, corrects the position of the ink discharge point using any one of a first mode and a second mode based on relationship information between two neighboring cell areas,
• wherein the correction unit corrects the position of the ink discharge point using the first mode when correcting a pattern recipe to be commonly applied to the two neighboring cell areas,
• wherein the correction unit corrects the position of the ink discharge point using the second mode when correcting a pattern recipe to be differentially applied to the two neighboring cell areas.

A system for treating a substrate comprising:

• a substrate support unit for supporting a substrate;
• a gantry unit movably installed on the substrate;
• an inkjet head module installed on the gantry unit and for discharging ink onto the substrate;
• and
• an ink impact point correction apparatus comprising a recognition unit for acquiring information on an impact point of ink at a plurality of points located on the substrate;
• and a correction unit for correcting a position of an ink discharge point on the substrate based on the information on the impact point,
• wherein a coordinate pattern in a form of a coordinate system is formed at the plurality of points.