Forming a passivation coating for mems devices
AssigneeTexas Instruments Incorporated
InventorsSimon Joshua Jacobs, Molly Nelis Sing, Lawerence Tucker Latham
Life of this patent
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Abstract
In described examples, a MEMS device component includes a passivation layer formed from a vapor and/or a liquid compound that may include precursors. The compound may contain amino acid, antioxidants, nitriles or other compounds, and may be disposed on a surface of the MEMS device component and/or a package or package portion thereof. If the compound is a precursor, it may be treated to cause formation of the passivation layer from the precursor.
Claims20
A method of manufacturing a microelectromechanical system (MEMS) device, the method comprising:
- exposing a MEMS device component to a vapor;
- and
- forming, after exposing the MEMS device component to the vapor, a passivation layer on at least one exposed surface of the MEMS device component, wherein the passivation layer comprises a compound comprising at least one amino acid.
A method of manufacturing a microelectromechanical system (MEMS) device, the method comprising:
- disposing a precursor in contact with at least a portion of a surface of a MEMS device component, wherein the precursor comprises a long-chain alcohol of at least 12 carbons;
- establishing an equilibrium distribution of the precursor on the surface of the MEMS device component;
- and
- transforming the precursor into a passivation layer in response to treating the MEMS device component, whereon the passivation layer is formed on the at least the portion of the surface of the MEMS device.
A method of manufacturing a microelectromechanical system (MEMS) device, the method comprising:
- exposing at least one contact surface of a MEMS device component to an organic compound comprising at least one ionic region and at least one hydrophobic region;
- actuating the organic compound in contact with the at least one contact surface of the MEMS device component;
- and
- forming, in response to actuating the organic compound, a passivation film on the at least one contact surface.
A microelectromechanical system (MEMS) device comprising:
- a MEMS component having a surface;
- and
- a passivation layer on at least a portion of the surface, wherein the passivation layer comprises a compound comprising an alkyl nitrile.
A method of method of manufacturing a microelectromechanical system (MEMS) device:
- exposing a MEMS device component to a vapor;
- and
- forming, after exposing the MEMS device component to the vapor, a passivation layer on at least one exposed surface of the MEMS device component, wherein the passivation layer comprises at least one antioxidant compound.
Dependencies are inferred from the claim text.