Schottky barrier diode
AssigneesTDK Corporation, Tamura Corporation, Novel Crystal Technology, Inc.
InventorsJun ARIMA, Minoru FUJITA, Jun HIRABAYASHI, Kohei SASAKI
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AssigneesTDK Corporation, Tamura Corporation, Novel Crystal Technology, Inc.
InventorsJun ARIMA, Minoru FUJITA, Jun HIRABAYASHI, Kohei SASAKI
Estimating the term…
An object of the present invention is to provide a Schottky barrier diode less liable to cause dielectric breakdown due to concentration of an electric field. A Schottky barrier diode according to this disclosure includes a semiconductor substrate made of gallium oxide, a drift layer made of gallium oxide and provided on the semiconductor substrate, an anode electrode brought into Schottky contact with the drift layer, and a cathode electrode brought into ohmic contact with the semiconductor substrate. The drift layer has an outer peripheral trench surrounding the anode electrode in a plan view. The surface of the drift layer positioned between the anode electrode and the outer peripheral trench is covered with a semiconductor layer having a conductivity type opposite to that of the drift layer.
A Schottky barrier diode comprising:
Dependencies are inferred from the claim text.