Image sensor and method for fabricating the same

An image sensor comprising:

• a substrate including a first surface and a second surface, the second surface being opposite the first surface and configured to be light incident;
• a photoelectric conversion layer in the substrate;
• a wiring structure on the first surface of the substrate, the wiring structure including a plurality of wiring layers;
• an interlayer insulating film on the second surface of the substrate;
• a capacitor structure in the interlayer insulating film, the capacitor structure including a first conductive pattern, a dielectric pattern, and a second conductive pattern sequentially stacked on the second surface of the substrate;
• and
• a first wiring on the interlayer insulating film, the first wiring being connected to one of the first conductive pattern and the second conductive pattern,
• wherein the first wiring includes a transparent conductive material.

An image sensor comprising:

• a substrate including a sensor array region and a peripheral circuit region, the substrate including a first surface and a second surface, the second surface being opposite the first surface and configured to be light incident;
• a photoelectric conversion layer in the sensor array region;
• a color filter on the second surface of the sensor array region;
• a capacitor structure on the second surface of the peripheral circuit region, the capacitor structure including a first conductive pattern, a dielectric pattern, and a second conductive pattern sequentially stacked;
• an interlayer insulating film that covers the color filter and the capacitor structure;
• an electrode that extends along an upper surface of the interlayer insulating film in the sensor array region;
• and
• a wiring extending along an upper surface of the interlayer insulating film in the peripheral circuit region, the first wiring being connected to one of the first conductive pattern and the second conductive pattern.