Array substrate, manufacturing method thereof, and display device

A manufacturing method of an array substrate, comprising:

• forming a first thin film transistor and a second thin film transistor in a first region and a second region of a base substrate, respectively, wherein forming the first thin film transistor comprises forming a first active layer, and forming the second thin film transistor comprises forming a second active layer,
• wherein forming the first active layer and forming the second active layer comprise:
• forming a semiconductor layer in the first region and the second region synchronously, wherein a portion of the semiconductor layer located in the first region is used to form the first active layer, and a portion of the semiconductor layer located in the second region is used to form the second active layer;
• and
• performing a treatment process on at least one of the portion of the semiconductor layer located in the first region and the portion of the semiconductor layer located in the second region so that the first active layer and the second active layer satisfy at least one of the following conditions:
• a carrier mobility of the first active layer is greater than that of the second active layer, and a carrier concentration of the first active layer is greater than that of the second active layer.