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US 2021/0343553 A1Published application
Semiconductor equipment and method for manufacturing semiconductor structure
OwnerXun YANinventor
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Abstract
The present application relates to semiconductor equipment and a method for manufacturing a semiconductor structure. The semiconductor equipment includes: a process chamber for processing a wafer; a gas intake apparatus, configured to introduce gas into the process chamber; and a gas distribution plate, located above the wafer and on a flow path of the gas; and at least part of the gas flows to a surface of the wafer through the gas distribution plate.
Claims14
Semiconductor equipment, comprising:
- a process chamber for processing a wafer;
- a gas intake apparatus, configured to introduce gas to the process chamber;
- and
- a gas distribution plate, located above the wafer and on a flow path of the gas, at least part of the gas flowing to a surface of the wafer through the gas distribution plate.
1 more element
Dependencies are inferred from the claim text.