Method and apparatus for analyzing parameter of mask plate

An apparatus for analyzing a parameter of a mask plate, comprising:

• a detection parameter acquisition module, configured to acquire a detection parameter of at least one mask pattern, wherein the detection parameter comprises a deviation coordinate between a measurement coordinate of each alignment mark in a mask pattern manufactured with a mask plate and a preset coordinate of each alignment mark in a layout of the mask pattern;
• a deviation vector acquisition module, configured to acquire, according to the detection parameter, a direction and a vector length of a deviation vector of the deviation coordinate of each alignment mark in the mask pattern;
• and
• an analysis data generation module, configured to generate quality analysis data of the mask plate according to the direction and the vector length of the deviation vector of each alignment mark in the mask pattern.