Back to results
US 2021/0341845 A1Published application
Gamma ray generator? gamma ray lithography system and method of performing gamma ray lithography
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYou-Hua Chou, Kuo-Sheng Chuang
Life of this patent
Estimating the term…
Abstract
A gamma ray generator includes a plate, a plurality of holes and a plurality of gamma ray sources. The plate is configured to rotate along a rotational axis. The holes are disposed in the plate, and the holes are arranged in a matrix. The gamma ray sources are respectively placed in the holes.
Claims20
A gamma ray generator, comprising:
- a plate, configured to rotate along a rotational axis;
- a plurality of holes in the plate, wherein the holes are arranged in a matrix;
- and
- a plurality of gamma ray sources, respectively placed in the holes.
1 more element
A gamma ray generator, comprising:
- a shaft, configured to rotate along a rotational axis;
- a plurality of holders surrounding and connecting to the shaft;
- and
- a plurality of gamma ray sources, respectively placed in the holders.
1 more element
A gamma ray lithography system, comprising:
- a gamma ray generator, comprising a plurality of gamma ray sources, wherein the gamma ray sources are arranged to surround a rotational axis;
- and
- a wafer stage, disposed below the gamma ray generator.
Dependencies are inferred from the claim text.