Salt, acid generator, resist composition and method for producing resist pattern
AssigneeSumitomo Chemical Company, Limited
InventorsKatsuhiro KOMURO, Takashi NAKAKOJI, Koji ICHIKAWA
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AssigneeSumitomo Chemical Company, Limited
InventorsKatsuhiro KOMURO, Takashi NAKAKOJI, Koji ICHIKAWA
Estimating the term…
A salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10 or —O-L1-CO—O—R10, L1 represents an alkanediyl group, R4, R5, R6, R7, R8 and R9 each represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, R10 represents an acid-labile group, X1, X2 and X3 each independently represent an oxygen atom or a sulfur atom, m1 is an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5, m6 and m7 represent an integer of 0 to 4, in which 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI− represents an organic anion.
A salt represented by formula (I):
Dependencies are inferred from the claim text.