Plasma Assisted Parylene Deposition
OwnerRobert Eugene Askin, III, Sean Owen Clancyinventors
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Abstract
A method for depositing parylene onto a substrate includes utilizing a vaporization chamber and a pyrolysis chamber to crack a dimer into a monomer gas, directly ionizing the monomer gas by passing the monomer gas through a plasma generation chamber comprising plasma prior to injection of the monomer gas into a deposition chamber, and polymerizing the ionized monomer in the deposition chamber to create a polymer and a protective coating on a substrate.
Claims20
A method for depositing parylene onto a substrate, comprising:
- utilizing a vaporization chamber and a pyrolysis chamber to crack a dimer into a monomer gas;
- directly ionizing the monomer gas by passing the monomer gas through a plasma generation chamber comprising plasma prior to injection of the monomer gas into a deposition chamber;
- polymerizing the ionized monomer in the deposition chamber to create a polymer and a protective coating on a substrate.
The method of claim 8, wherein the monomer is a parylene monomer.
A method for depositing parylene onto a substrate, comprising:
- injecting a monomer gas into a deposition chamber;
- injecting a plasma into the deposition chamber, the plasma generated in a plasma generation chamber;
- ionizing the monomer gas with the plasma to generate ionized monomer;
- and
- polymerizing the ionized monomer to create a polymer and a protective coating on a substrate.
A system comprising:
- a pyrolysis chamber configured to crack a dimer into a monomer gas;
- a plasma generation system configured to generate a plasma;
- a deposition chamber configured to facilitate polymerization of an ionized monomer gas into a polymer and a protective coating on a substrate.
Dependencies are inferred from the claim text.