Color filter substrate and manufacturing method thereof

A color filter substrate, comprising:

• a transparent substrate;
• a color resist layer formed on the transparent substrate, wherein the color resist layer has at least one recess and at least one flat portion;
• a transparent conductive layer formed on the color resist layer;
• and
• a black photosensitive layer formed on the transparent conductive layer;
• wherein the black photosensitive layer comprises a first protruding portion and a second protruding portion, the first protruding portion is disposed on the recess and extends into the recess, the second protruding portion is disposed on the flat portion, and a height of the second protruding portion is greater than a height of the first protruding portion.

A manufacturing method of a color filter substrate, comprising steps of:

• providing a transparent substrate;
• forming a color resist layer on the transparent substrate, wherein the color resist layer has at least one recess and at least one flat portion;
• forming a transparent conductive layer on the color resist layer;
• and
• using a half-tone mask to form a black photosensitive layer on the transparent conductive layer;
• wherein the black photosensitive layer comprises a first protruding portion and a second protruding portion, the first protruding portion is disposed correspondingly on the recess and extends into the recess, the second protruding portion is disposed correspondingly on the flat portion, and a height of the second protruding portion is greater than a height of the first protruding portion.