Process for providing a corrosion resistant coated glass substrate

A process according to claim, wherein the silica layer or each silica layer has a thickness in the range:

• 15 nm to 300;
• preferably 20 nm to 300 nm;
• more preferably 20 nm to 280 nm;
• and most preferably 20 nm to 250 nm.

A process for producing a corrosion-resistant coated glass substrate suitable for use in a humid environment, the process comprising:

• i) providing a soda lime silica glass substrate;
• ii) providing a liquid coating composition comprising a polysilazane at a concentration of between 0.5% and 80% by weight;
• iii) contacting one or both surfaces of the glass substrate directly with the coating composition;
• and
• iv) curing the coating composition thereby forming a corrosion-resistant coated glass substrate having a silica layer on one or both sides of the glass substrate, wherein
• v) the silica layer on one or each surface of the glass substrate comprises 97% or more silica in the form of SiO2;
• and wherein
• vi) the silica layer on one or each surface of the glass substrate comprises a fully-densified, continuous, non-porous film.

A process for producing a corrosion-resistant coated glass substrate suitable for use in a humid environment, the process comprising:

• i) providing a soda lime silica glass substrate;
• ii) providing a liquid coating composition comprising a polysilazane at a concentration of between 0.5% and 80% by weight;
• iii) contacting one or both surfaces of the glass substrate directly with the coating composition;
• and
• iv) curing the coating composition thereby forming a corrosion-resistant coated glass substrate having a silica layer on one or both sides of the glass substrate, wherein
• v) the silica layer on one or each surface of the glass substrate comprises 97% or more silica in the form of SiO2;
• and wherein
• vi) the silica layer on one or each surface of the glass substrate comprises a fully-densified, continuous, non-porous film, and
• vii) the silica layer on one or each surface of the glass substrate has a thickness of 75 nm or higher and a thickness of less than 144 nm.