Method of restoring collapsed pattern, substrate processing method, and substrate processing device

A method for processing a substrate in which a pattern is formed on a front surface thereof,

• the substrate processing method which includes;
• a processing liquid supplying step which supplies a processing liquid to the front surface of the substrate,
• a spin drying step in which the substrate is rotated at a high speed and dried by spinning off the liquid after the processing liquid supplying step, and
• a pattern recovering step which is executed after the spin drying step, the pattern recovering step in which a reactive gas supplying step for supplying to the front surface of the substrate a reactive gas that can react with a product existing on the front surface is executed to recover a collapsed pattern.

A substrate processing apparatus, comprising:

• a substrate holding unit which holds a substrate in which a pattern is formed on a front surface thereof;
• a rotation unit for rotating the substrate held by the substrate holding unit around a rotation axis passing through a central portion thereof;
• a processing liquid supplying unit for supplying a processing liquid to the front surface of the substrate held by the substrate holding unit;
• a reactive gas supplying unit for supplying to the front surface of the substrate held by the substrate holding unit a reactive gas that can react with a product existing on the front surface;
• and
• a controller which controls the rotation unit, the processing liquid supplying unit and the reactive gas supplying unit, wherein
• the controller executes
• a processing liquid supplying step which supplies a processing liquid to the front surface of the substrate,
• a spin drying step in which the substrate is rotated at a high speed and dried by spinning off the liquid after the processing liquid supplying step, and
• a pattern recovering step which is executed after the spin drying step, the pattern recovering step in which a reactive gas supplying step for supplying to the front surface of the substrate a reactive gas that can react with a product existing on the front surface is executed to recover a collapsed pattern.