Inspection method and plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsYusuke HIRAYAMA, Shu KUSANO
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Abstract
An inspection method is provided. The inspection method includes monitoring power of a reflected wave of a power wave supplied from a source power supply for generation of plasma in a plasma processing apparatus, and obtaining a fluctuation amount of a measured value within a period after initiation of the supply of the power wave. The fluctuation amount the measured value is a fluctuation amount indicating a fluctuation in a peak-to-peak voltage at a lower electrode of the substrate support in the chamber or a fluctuation amount indicating a fluctuation in impedance of a load including the lower electrode.
Claims13
An inspection method comprising:
- monitoring power of a reflected wave of a power wave supplied from a source power supply for generation of plasma in a plasma processing apparatus, wherein the power wave is a radio frequency wave or a microwave, the plasma processing apparatus comprises a chamber and a substrate support configured to support a substrate in the chamber, and the substrate support comprises a lower electrode;
- and
- obtaining a fluctuation amount of a measured value within a period after initiation of the supply of the power wave, wherein the fluctuation amount of the measured value is a fluctuation amount indicating a fluctuation in a peak-to-peak voltage at the lower electrode or a fluctuation amount indicating a fluctuation in impedance of a load including the lower electrode.
A plasma processing apparatus comprising:
- a chamber;
- a substrate support comprising a lower electrode and configured to support a substrate in the chamber;
- a source power supply configured to supply a power wave for generation of plasma from gas in the chamber, wherein the power wave is a radio frequency wave or a microwave;
- a matching unit connected between the chamber and the source power supply;
- a measuring unit configured to measure power of a reflected wave of the power wave;
- and
- a control unit,
- wherein the control unit is configured to obtain a fluctuation amount of a measured value within a period after initiation of the supply of the power wave, and
- the fluctuation amount of the measured value is a fluctuation amount indicating a fluctuation in peak-to-peak voltage at the lower electrode or a fluctuation amount indicating a fluctuation in impedance of a load including the lower electrode.
Dependencies are inferred from the claim text.