US 2021/0280397 A1 · PLASMA PROCESSING APPARATUS, SEMICONDUCTIVE MEMBER, AND SEMICONDUCTIVE RING

Abstract

A plasma processing apparatus includes a chamber, a stage, a semiconductive ring, a power source, at least one conductive member, and a conductive layer. The chamber has a plasma processing space. The stage is disposed in the plasma processing space and has an electrostatic chuck. The semiconductive ring is disposed on the stage so as to surround a substrate placed on the stage, the semiconductive ring having a first face. The at least one conductive member is disposed in the stage and in electrical connection with the power source. The conductive layer is disposed on the first face of the semiconductive ring and in electrical connection with the at least one conductive member.

Claims13

Dependent claims

A plasma processing apparatus, comprising:

a chamber having a plasma processing space;
a stage disposed in the plasma processing space, the stage having an electrostatic chuck;
a semiconductive ring disposed on the stage so as to surround a substrate placed on the stage, the semiconductive ring having a first face;
a power source;
at least one conductive member disposed in the stage, the conductive member being in electrical connection with the power source;
and
a conductive layer disposed on the first face of the semiconductive ring, the conductive layer being in electrical connection with the at least one conductive member.

4 more elements

Dependencies are inferred from the claim text.

Plasma processing apparatus, semiconductive member, and semiconductive ring

Life of this patent

Plasma processing apparatus, semiconductive member, and semiconductive ring

Life of this patent

Abstract

Claims13