System and method for managing substrate outgassing
AssigneeApplied Materials, Inc.
InventorsMatthew SPULLER, Dongming IU
Life of this patent
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Abstract
Embodiments of the present disclosure relate to apparatus, systems and methods for managing organic compounds in thermal processing chambers. A gas line can be in fluid communication with the thermal processing chamber and an exhaust pump can be coupled to the thermal processing chamber by an exhaust conduit and controlled by an effluent flow control valve. The apparatus includes a sampling line with an organic compound sensor coupled to the exhaust conduit. The organic compound sensor can be in communication with a control module which can control operating parameters for processing a substrate.
Claims20
A substrate processing apparatus, comprising:
- a thermal processing chamber defining a processing volume;
- a gas line coupled to the thermal processing chamber;
- an exhaust pump coupled to the thermal processing chamber by an exhaust conduit;
- an exhaust flow controller coupled to the exhaust conduit;
- and
- a sampling line coupled to the exhaust conduit, the sampling line comprising an organic compound sensor and a sampling flow control valve, the organic compound sensor being communicatively coupled to the exhaust flow controller.
A method of processing a substrate comprising,
- processing a substrate in a thermal processing chamber using one or more operating parameters;
- generating sensor data from a sensor reading of an effluent of the thermal processing chamber using an organic compound sensor;
- determining at least one property of the effluent based on the sensor data;
- and
- adjusting the one or more operating parameters for processing the substrate based on the at least one property.
A system programmed to perform a method, comprising:
- an algorithm stored in a memory of the system, wherein the algorithm comprises a number of instructions which, when executed by a processor, causes a method to be performed, comprising:
- processing a substrate in a thermal processing chamber using one or more operating parameters;
- generating sensor data from a sensor reading of an effluent of the thermal processing chamber using an organic compound sensor;
- determining at least one property of the effluent based on the sensor data;
- and
- adjusting the one or more operating parameters for processing the substrate based on the at least one property.
Dependencies are inferred from the claim text.