Large-area vhf pecvd chamber for low-damage and high-throughput plasma processing

A plasma processing chamber, comprising:

• a diffuser;
• a backing plate coupled to the diffuser, wherein the backing plate has an opening at a substantial center of the backing plate for a gas feed;
• a first VHF power generator coupled to the backing plate at a first radius from a center of the backing plate and at a first azimuth angle;
• a second VHF power generator coupled to the backing plate at a second radius from the center of the backing plate and at a second azimuth angle;
• a third VHF power generator coupled to the backing plate at a third radius from the center of the backing plate and at a third azimuth angle;
• a fourth VHF power generator coupled to the backing plate at a fourth radius from the center of the backing plate and at a fourth azimuth angle;
• and
• a controller operatively connected to the plasma processing chamber, wherein the controller is programmed to control operation of the first VHF power generator, the second VHF power generator, the third VHF power generator, and the fourth VHF power generator.

A plasma processing chamber, comprising:

• a diffuser;
• a backing plate coupled to the diffuser, wherein the backing plate has an opening at a substantial center of the backing plate for a gas feed;
• a plurality of VHF power generators, wherein each VHF power generator is coupled to the backing plate at a location disposed approximate an edge of the backing plate;
• and
• at least one magnetic ferrite block coupled to the backing plate.