Ion implanter and model generation method
AssigneeSumitomo Heavy Industries Ion Technology Co., Ltd.
InventorsKazuhisa Ishibashi, Tetsuya Kudo, Mikio Yamaguchi
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Abstract
There is provided an ion implanter including a beam generation device that generates an ion beam, based on an implantation recipe, a plurality of measurement devices that measure at least one physical quantity of the ion beam, and a control device that acquires a data set including a plurality of measurement values measured by the plurality of measurement devices, and evaluates measurement validity of the at least one physical quantity of the ion beam by using a model representing a correlation between the plurality of measurement values.
Claims11
An ion implanter comprising:
- a beam generation device that generates an ion beam, based on an implantation recipe;
- a plurality of measurement devices that measure at least one physical quantity of the ion beam;
- and
- a control device that acquires a data set including a plurality of measurement values measured by the plurality of measurement devices, and evaluates measurement validity of the at least one physical quantity of the ion beam by using a model representing a correlation between the plurality of measurement values.
A model generation method comprising:
- acquiring a data set including a plurality of measurement values indicating at least one physical quantity of an ion beam generated based on an implantation recipe from a plurality of measurement devices that measure the ion beam;
- and
- building a model representing a correlation between the plurality of measurement values from a plurality of the data sets acquired during a plurality of implantation processes based on the implantation recipe.
Dependencies are inferred from the claim text.