Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsDaisuke HAYASHI, Kengo KANEKO, Katsuyuki KOIZUMI
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AssigneeTokyo Electron Limited
InventorsDaisuke HAYASHI, Kengo KANEKO, Katsuyuki KOIZUMI
Estimating the term…
A plasma processing apparatus includes an external circuit electrically connected through a line to an electrical component in a processing chamber and a filter provided on the line to attenuate or block noise introduced into the line from the electrical component toward the external circuit. The filter includes a coil having constant diameter and coil length; a tubular outer conductor accommodating the coil and forming a distributed constant line in which parallel resonance occurs at multiple frequencies in combination with the coil; and a movable member for changing each winding gap of the coil and provided in an effective section where a specific one or a plurality of parallel resonance frequencies is shifted to a higher frequency side or a lower frequency side in frequency-impedance characteristics of the filter by changing the winding gap of the coil in the effective section in a longitudinal direction of the coil.
A filter device comprising:
A plasma processing apparatus comprising:
A filter device for use in a plasma processing apparatus comprising:
Dependencies are inferred from the claim text.