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US 2021/0279848 A1Published application
Determining locations of suspected defects
AssigneeApplied Materials Israel Ltd.
InventorsOfir Greenberg, Dan Segal, Dae Hwan Youn, Tal Ben-Shlomo
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Abstract
A method, a non-transitory computer readable medium and a detection system for determining locations of suspected defects of a substrate.
Claims13
A method for determining locations of suspected defects of a substrate, the method comprises:
- determining, by a charged particle review system (CPRS), CPRS determined locations of a group of suspected defects;
- wherein the determining is based at least in part on optical wafer inspection system (OWIS) determined locations of the group of suspected defects;
- wherein the suspected defects of the group are only a part of the suspected defects of the substrate;
- for each permutation of suspected defects out of multiple permutations of suspected defects, calculating a permutation related mapping to provide multiple permutation relation mappings;
- wherein each permutation relation mapping maps CPRS determined locations of the suspected defects of the permutation, to OWIS determined locations of the suspected defects of the permutation;
- wherein each permutation of suspected defects is formed by subgroup of the group of suspected defects;
- selecting a selected permutation related mapping;
- determining whether to use the selected permutation related mapping for converting the OWIS determined locations of the suspected defects of the substrate to CPRS determined locations of the suspected defects of the substrate;
- and
- converting the OWIS determined locations of the suspected defects of the substrate to CPRS determined locations of the suspected defects of the substrate, by using the selected permutation related mapping, when determining to use the selected permutation related mapping.
7 more elements
A charged particle review system (CPRS), comprising:
- a memory unit that is configured to store optical wafer inspection system (OWIS) determined locations of a group of suspected defects;
- a processor that is configured to:
- determine CPRS determined locations of a group of suspected defects;
- wherein the determining is based at least in part on the OWIS determined locations of the group of suspected defects;
- wherein the suspected defects of the group are only a part of the suspected defects of the substrate;
- for each permutation of suspected defects out of multiple permutations of suspected defects, calculate a permutation related mapping to provide multiple permutation relation mappings;
- wherein each permutation relation mapping maps CPRS determined locations of the suspected defects of the permutation, to OWIS determined locations of the suspected defects of the permutation;
- wherein each permutation of suspected defects is formed by subgroup of the group of suspected defects;
- select a selected permutation related mapping;
- determine whether to use the selected permutation related mapping for converting the OWIS determined locations of the suspected defects of the substrate to CPRS determined locations of the suspected defects of the substrate;
- and
- convert the OWIS determined locations of the suspected defects of the substrate to CPRS determined locations of the suspected defects of the substrate, by using the selected permutation related mapping, when determining to use the selected permutation related mapping.
9 more elements
A non-transitory computer readable medium that stores instructions for:
- determining, by a charged particle review system (CPRS), CPRS determined locations of a group of suspected defects;
- wherein the determining is based at least in part on optical wafer inspection system (OWIS) determined locations of the group of suspected defects;
- wherein the suspected defects of the group are only a part of suspected defects of the substrate;
- for each permutation of suspected defects out of multiple permutations of suspected defects, calculating a permutation related mapping to provide multiple permutation relation mappings;
- wherein each permutation relation mapping maps CPRS determined locations of the suspected defects of the permutation, to OWIS determined locations of the suspected defects of the permutation;
- wherein each permutation of suspected defects is formed by subgroup of the group of suspected defects;
- selecting a selected permutation related mapping;
- determining whether to use the selected permutation related mapping for converting the OWIS determined locations of the suspected defects of the substrate to CPRS determined locations of the suspected defects of the substrate;
- and
- converting the OWIS determined locations of the suspected defects of the substrate to CPRS determined locations of the suspected defects of the substrate, by using the selected permutation related mapping, when determining to use the selected permutation related mapping.
7 more elements
Dependencies are inferred from the claim text.