Substrate processing apparatus and substrate processing method
AssigneeTokyo Electron Limited
InventorsYoji Sakata, Masashi Tsuchiyama, Tsuyoshi Watanabe
Life of this patent
Estimating the term…
Loading patent…
AssigneeTokyo Electron Limited
InventorsYoji Sakata, Masashi Tsuchiyama, Tsuyoshi Watanabe
Estimating the term…
A substrate processing apparatus includes a first unit block including a first substrate transfer region, a first and a second processing modules provided to face a first and a second sides of the first substrate transfer region in a left-right direction, and a first and a second transfer mechanisms provided at the first and the second sides and configured to deliver a substrate to the first and the second processing modules; a second unit block, stacked on the first unit block, including a second substrate transfer region and a third transfer mechanism; a substrate carry-in/out block provided at a first side of a stack of the unit blocks and configured to deliver the substrate to the first and the third transfer mechanisms; a relay block provided at a second side of the stack and configured to deliver the substrate to the second and the third transfer mechanisms.
A substrate processing apparatus, comprising:
A substrate processing method, comprising:
Dependencies are inferred from the claim text.