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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTsun-Cheng Tang, Cheng-Ming Lin, Sheng-Chang Hsu, Hao-Ming Chang, Way-Len Chang
Estimating the term…
In accordance with some embodiments of the present disclosure, an inspection method of a photomask includes performing a first inspection process, unloading the photomask from the inspection system, and performing a second inspection process. In the first inspection process, a common Z calibration map of an objective lens of an optical module with respect to the photomask is generated and stored, and a first image of the photomask is captured by using an image sensor while focusing the objective lens of the optical module based on the common Z calibration map. The photomask is unloaded from the inspection system. In the second inspection process, the photomask is loaded on the inspection system and a second image of the photomask is captured by using an image sensor while focusing an objective lens of an optical module based on the common Z calibration map generated in the first inspection process.
A method of fabricating a photomask, comprising:
A method of inspecting a photomask, comprising:
A method of fabricating a photomask, comprising:
Dependencies are inferred from the claim text.