Molecular Layer Deposition of Amorphous Carbon Films
AssigneesApplied Materials, Inc., National University of Singapore
InventorsBhaskar Jyoti Bhuyan, Mark Saly, Ahbijit Basu Mallick, Eugene Yu Jin Kong, Bo Qi
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Abstract
Methods of forming carbon polymer films are disclosed. Some methods are advantageously performed at lower temperatures. The substrate is exposed to a first carbon precursor to form a substrate surface with terminations based on the reactive functional groups of the first carbon precursor and exposed to a second carbon precursor to react with the surface terminations and form a carbon polymer film. Processing tools and non-transitory memories to perform the process are also disclosed.
Claims20
A method of depositing a film, the method comprising:
- exposing a substrate to a first carbon precursor to form a first precursor terminated surface on the substrate;
- and
- exposing the first precursor terminated surface to a second carbon precursor to form a conformal carbon polymer film on the substrate.
A processing tool comprising:
- a central transfer station with at least one deposition chamber and at least one annealing chamber connected to a side of the central transfer station;
- and
- a controller having one or more of:
- a configuration to move a substrate from the central transfer station to the at least one deposition chamber;
- a configuration to move a substrate from the at least one deposition chamber to the central transfer station;
- a configuration to move a substrate from the central transfer station to the at least one annealing chamber;
- a configuration to move a substrate from the at least one annealing chamber to the central transfer station;
- a configuration to expose a substrate to a first carbon precursor to form a first precursor terminated surface on the substrate;
- a configuration to expose the substrate to a second carbon precursor to react with the first precursor terminated surface to form a carbon polymer film on the substrate;
- a configuration to expose the carbon polymer film on a substrate to a plasma treatment;
- and a configuration to anneal the carbon polymer film.
A non-transitory computer readable medium including instructions, that, when executed by a controller of a processing chamber, causes the processing chamber to perform operations of:
- expose a substrate to a first carbon precursor in a processing chamber;
- purge the processing chamber of the first carbon precursor;
- expose the substrate a second carbon precursor in the processing chamber;
- purge the processing chamber of the second carbon precursor;'
- move the substrate from the processing chamber to an annealing chamber;
- and/or
- anneal the substrate in the annealing chamber.
Dependencies are inferred from the claim text.