Methods of forming graphene and graphene manufacturing apparatuses

A graphene manufacturing apparatus, comprising:

• a reaction chamber;
• a substrate supporter inside the reaction chamber, the substrate supporter configured to structurally support a substrate inside the reaction chamber;
• a plasma generator configured to generate a plasma inside the reaction chamber;
• a first gas supply configured to supply an inert gas into the reaction chamber at a first height from an upper surface of the substrate supporter in a height direction of the reaction chamber;
• a second gas supply configured to supply a carbon source into the reaction chamber at a second height from the upper surface of the substrate supporter in the height direction of the reaction chamber;
• and
• a third gas supply configured to supply a reducing gas into the reaction chamber at a third height from the upper surface of the substrate supporter in the height direction of the reaction chamber,
• wherein the first height is greater than the second height, and the second height is greater than the third height.