Plasmonic photoelectrochemical oxidation face mask
AssigneeUniversity of South Florida
InventorsDharendra Yogi Goswami, Dilip Neeraj Goswami
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Abstract
A breathing system for removing harmful contaminants, such as microbes and volatile organic compounds, is provided. The breathing system includes a face mask, an inhalation limb, and a plasmonic device. As a contaminated gas flows through an internal chamber of the plasmonic device, the contaminates are oxidized. Specifically, the internal chamber includes a source of photons spaced apart from the nanostructure. The nanostructure is coated in a plasmonic layer, including noble metal nanoparticles. The plasmonic layer is protected from oxidation through a photocatalyst layer disposed thereon.
Claims20
A breathing purification system for delivering a gas from an environment to a user, the breathing system comprising:
- an inhalation limb including a first end in one way fluid communication with a face mask and a second opposite end in one way fluid communication with a plasmonic device;
- and
- the plasmonic device includes an internal compartment comprising:
- a source of photons having a wavelength and a filter, the filter including:
- a nanostructure having a length ⅓ to ¼ the wavelength;
- a plasmonic layer disposed on the nanostructure, the plasmonic layer including noble metal nanoparticles;
- a protective layer applied to the nanostructure, wherein the protective layer prevents the oxidization of the noble metal nanoparticles of the plasmonic layer;
- the plasmonic layer disposed between the nanostructure and the protective layer;
- wherein the photons emitted by the source of photons are incident on the filter;
- whereby the gas from the environment is filtered within the internal compartment before being supplied to the user via the face mask.
A breathing purification system for delivering a gas from an environment to a user, the breathing circuit comprising:
- an inhalation limb including a first end in fluid communication with a face mask and a second opposite end in fluid communication with a plasmonic device;
- the plasmonic device including an internal compartment disposed within the plasmonic device, the internal compartment comprising:
- a source of photons having a wavelength and a filter, the filter including:
- a nanostructure having a length ⅓ to ¼ the wavelength;
- a plasmonic layer disposed on the nanostructure via e-beam or plasma deposition, the plasmonic layer including noble metal nanoparticles;
- a protective layer including a non-porous photocatalyst, the protective layer having a thickness of less than 20 nm, wherein the protective layer prevents the oxidization of the noble metal nanoparticles of the plasmonic layer;
- wherein the plasmonic layer is disposed between the nanostructure and the protective layer;
- wherein the photons emitted by the source of photons are incident on the filter, thereby activating the photocatalyst;
- and
- a one-way valve disposed between the face mask and the plasmonic device, the one-way valve operable to transition between a closed configuration and an open configuration, wherein the close configuration occurring as a result of positive pressure in the inhalation limb, and the open configuration occurring as a result of negative pressure in the inhalation limb;
- wherein the gas from the environment flows through the internal compartment of the plasmonic device, such that when the user inhales, the filtered gas flows to the face mask via the inhalation limb as a result of the negative pressure created when the user inhales.
A method of removing harmful contaminants from a gas supplied to a user for respiration, the method comprising the steps of:
- providing a breathing system configured to supply an amount of the gas to the user, the breathing system comprising:
- an inhalation limb having a first end in fluid communication with a face mask and a second opposite end in fluid communication with a plasmonic device having an internal compartment disposed therein, the internal compartment comprising:
- a source of photons having a wavelength and a filter, the filter including:
- a nanostructure having a length ⅓ to ¼ the wavelength;
- a plasmonic layer disposed on the nanostructure, the plasmonic layer including noble metal nanoparticles;
- a protective layer including a photocatalyst, the protective layer disposed on the nanostructure having a thickness of less than 20 nm, wherein the protective layer prevents the oxidization of the noble metal nanoparticles of the plasmonic layer;
- the plasmonic layer being disposed between the nanostructure and the protective layer;
- wherein the photons emitted by the source of photons are incident on the photocatalyst, thereby activating the photocatalyst;
- passing the gas from an environment through the internal compartment and into the inhalation limb, thereby removing harmful contaminants from the gas via catalytic oxidation of the harmful contaminants as the gas passes through the filter of the internal compartment;
- and
- operating a one-way valve disposed between the face mask and the plasmonic device, the one-way valve including a closed configuration and an open configuration, the close configuration occurring when there is positive pressure within the inhalation limb, and the open configuration occurring when there is negative pressure in the inhalation limb,
- wherein when in the open configuration, the gas flows from the internal compartment where the gas is filtered to remove harmful contaminants, through the inhalation limb, and to the face mask of the user, thereby permitting the user to breathe the filtered gas during respiration.
Dependencies are inferred from the claim text.