Method for manufacturing organic electronic device

Abstract

A method for manufacturing an organic electronic device according to an embodiment includes: an organic function layer formation step of forming an organic function layer having a monolayer structure or a multilayer structure on a first electrode layer formed on a long flexible film 10; and a second electrode layer formation step of forming a second electrode layer on the organic function layer, in which the organic function layer formation step includes a coating layer formation step of forming a coating layer 181a by a coating method, and a heating step of heating the coating layer with infrared rays to obtain a function layer, while conveying the flexible film by a roll 28 whose surface 28a is made of an infrared absorbing material, and an average absorption rate of infrared rays in a wavelength range of 3 μm to 10 μm in the infrared absorbing material is 0.8 or more.

Dependencies are inferred from the claim text.