Semiconductor device and manufacturing method of semiconductor device

Abstract

Provided is a semiconductor device, comprising: a semiconductor substrate provided with an N-type region, wherein the N-type region is a region including a center position in a depth direction of the semiconductor substrate; and the N-type region includes an acceptor with a concentration that is a lower concentration than a carrier concentration, and is 0.001 times or more of a carrier concentration at the center position. A semiconductor device can be manufactured by a manufacturing method, comprising: a preparation step configured to prepare a P-type semiconductor substrate; and a first inverting step configured to form an N-type region including a center position in a depth direction of the semiconductor substrate, by implanting an N-type impurity into the P-type semiconductor substrate and performing heat treatment.

Dependencies are inferred from the claim text.