Hydrogen fluoride vapor phase corrosion apparatus and method

A hydrogen fluoride vapor phase corrosion apparatus, comprising a reaction chamber, a vapor phase hydrogen fluoride source, and a hydrogen fluoride vapor phase gain device,

• wherein the reaction chamber is provided with a first gas inlet and a second gas inlet, with the first gas inlet being connected to the vapor phase hydrogen fluoride source and the second gas inlet being connected to the hydrogen fluoride vapor phase gain device, and
• the hydrogen fluoride vapor phase gain device is configured to perform a gas-liquid mixing and vaporizing of a prescribed organic liquid and introduce it into the reaction chamber through the second gas inlet after a wafer placed in the reaction chamber reacts with a vapor phase hydrogen fluoride admitted from the first gas inlet, so that the prescribed vaporized organic liquid and residual water on a surface of the wafer form an azeotropic mixture which evaporates or volatilizes more readily than water so as to be evaporated or volatilized easily from the surface of the wafer to be carried out.