Procedural electron beam lithography

A computer system comprising:

• a non-transitory computer readable storage device storing an oracle function associated with a pattern, wherein the oracle function is executable to receive as an input coordinates of a substrate and to provide an output including control data usable by an electron beam lithography (EBL) system at the coordinates of the substrate;
• a control system having one or more hardware computer processors, the control system configured to, for each of the plurality of fields of a pattern to be produced on a substrate:
• for each of a plurality of coordinates of a substrate:
• determine coordinates of a substrate;
• call the oracle function using the determined coordinates of the substrate;
• receive, from the oracle function, control data configured to control operation of an electron beam lithography (EBL) system;
• transmit the control data to EBL drive electronics;
• and
• EBL drive electronics configured to:
• receive the control data;
• determine one or more of a current, voltage, blanking, or stage control of the electronic beam lithography based on the control data.