Resistive random access memory device with three-dimensional cross-point structure and method of operating the same
AssigneeToshiba Memory Corporation
InventorsKikuko SUGIMAE, Yusuke ARAYASHIKI
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AssigneeToshiba Memory Corporation
InventorsKikuko SUGIMAE, Yusuke ARAYASHIKI
Estimating the term…
A memory device according to an embodiment includes a first interconnect, a second interconnect, a first variable resistance member, a third interconnect, a second variable resistance member, a fourth interconnect, a fifth interconnect and a third variable resistance member. The first interconnect, the third interconnect and the fourth interconnect extend in a first direction. The second interconnect and the fifth interconnect extend in a second direction crossing the first direction. The first variable resistance member is connected between the first interconnect and the second interconnect. The second variable resistance member is connected between the second interconnect and the third interconnect. The third variable resistance member is connected between the fourth interconnect and the fifth interconnect. The fourth interconnect is insulated from the third interconnect.
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A method for manufacturing a semiconductor memory device comprising:
Dependencies are inferred from the claim text.