Model calibration and guided metrology based on smart sampling
AssigneeASML Netherlands B.V.
InventorJun CHEN
Life of this patent
Estimating the term…
Abstract
A method for calibrating a process model of a patterning process. The method includes identifying a portion of the substrate that has values within a tolerance band of one or more parameters (e.g., CD, EPE, etc.) of the patterning process, obtaining, via a metrology tool, metrology data corresponding to the portion of the substrate, processing the metrology data, and calibrating a process model based on the processed metrology data.
Claims20
A method comprising:
- identifying, via a processor system, a portion of a substrate that has values within a tolerance band of one or more parameters of a patterning process;
- obtaining, via a metrology tool, metrology data corresponding to the portion of the substrate;
- and
- calibrating, via the processor, a process model based on the metrology data.
A computer program product comprising a non-transitory computer readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
- identify a portion of a substrate that has values within a tolerance band of one or more parameters of a patterning process;
- obtain, via a metrology tool, metrology data corresponding to the portion of the substrate;
- and
- calibrate a process model based on the metrology data.
Dependencies are inferred from the claim text.