Manufacturing method for semiconductor device
AssigneeNitto Denko Corporation
InventorsRyota MITA, Tomoaki ICHIKAWA
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AssigneeNitto Denko Corporation
InventorsRyota MITA, Tomoaki ICHIKAWA
Estimating the term…
A semiconductor device manufacturing method includes a preparation step and a sinter bonding step. In the preparation step, a sinter-bonding work having a multilayer structure including a substrate, semiconductor chips, and sinter-bonding material layers is prepared. The semiconductor chips are disposed on, and will bond to, one side of the substrate. Each sinter-bonding material layer contains sinterable particles and is disposed between each semiconductor chip and the substrate. In the sinter bonding step, a cushioning sheet having a thickness of 5 to 5000 μm and a tensile elastic modulus of 2 to 150 MPa is placed on the sinter-bonding work, the resulting stack is held between a pair of pressing faces, and, in this state, the sinter-bonding work between the pressing faces undergoes a heating process while being pressurized in its lamination direction, to form a sintered layer from each sinter-bonding material layer.
A method for manufacturing a semiconductor device, the method comprising the steps of
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