Resist structure for forming bumps
AssigneeInternational Business Machines Corporation
InventorsEiji Nakamura, Toyohiro Aoki, Takashi Hisada, Risa Miyazawa
Life of this patent
Estimating the term…
Loading patent…
AssigneeInternational Business Machines Corporation
InventorsEiji Nakamura, Toyohiro Aoki, Takashi Hisada, Risa Miyazawa
Estimating the term…
A method for fabricating a resist structure is presented. The method includes preparing a substrate on which plural conductive pads are formed; and patterning a lower resist to form plural lower cavities. The lower resist is deposited above the substrate. Each of the plural lower cavities are located above a corresponding one of the plural conductive pads. Additionally, the method includes patterning an upper resist to form plural upper cavities. The upper resist is deposited on the lower resist. Each of the plural upper cavities are located on a corresponding one of the plural lower cavities and have a diameter larger than a diameter of the corresponding one of the plural lower cavities.
A method for fabricating a resist structure, the method comprising:
A method for fabricating a semiconductor device, the method comprising:
A resist structure comprising:
A semiconductor device comprising:
An electronic apparatus comprising:
Dependencies are inferred from the claim text.