Electrostatic chuck heater and manufacturing method therefor
AssigneeMiCo Ceramics Ltd.
InventorsChul Ho JUNG, Jin Young CHOI
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Abstract
The present invention relates to an electrostatic chuck heater and a manufacturing method therefor and, more particularly, to an electrostatic chuck heater comprising: a ground electrode; and an electrostatic chuck electrode spaced a predetermined distance apart from the outside of the ground electrode, wherein the heater can reduce the phenomenon of rising of a wafer edge and thus can significantly reduce the temperature deviation according to positions on a heating surface of an object, such as a wafer, so as to increase the temperature uniformity of the heating surface.
Claims16
An electrostatic chuck heater comprising:
- a ground electrode 310;
- and
- an electrostatic chuck electrode 320 spaced a predetermined distance apart from an outer side of the ground electrode 310.
A method of manufacturing an electrostatic chuck heater, the method comprising:
- forming a ceramic powder layer structure 700 in which a ceramic molded body 720, in which a ground electrode 310 and an electrostatic chuck electrode 320 are embedded, is interposed between a first ceramic powder layer 710 and a second ceramic powder layer 730;
- and
- sintering the ceramic powder layer structure 700,
- wherein the electrostatic chuck electrode 320 is spaced a predetermined distance apart from an outer side of the ground electrode 310.
Dependencies are inferred from the claim text.