Laser sustained plasma light source with high pressure flow
AssigneeKLA Corporation
InventorAnatoly Shchemelinin
Life of this patent
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AssigneeKLA Corporation
InventorAnatoly Shchemelinin
Estimating the term…
A broadband radiation source is disclosed. The source may include a gas containment vessel configured to maintain a plasma and emit broadband radiation. The source may also include a recirculation gas loop fluidically coupled to the gas containment vessel. The recirculation gas loop may be configured to transport gas from one or more gas boosters configured to pressurize the low-pressure gas into a high-pressure gas and transport the high-pressure gas to the recirculation loop via an outlet. The system includes a pressurized gas reservoir fluidically coupled to the outlet of the one or more gas boosters and is configured to receive and store high pressure gas from the one or more gas boosters. The source includes a pressurized gas reservoir located between the one or more gas boosters and the gas containment vessel and is configured to receive and store high pressure gas from the one or more gas boosters.
A gas recirculation apparatus comprising:
A broadband light source comprising:
An optical characterization system comprising:
A method comprising:
Dependencies are inferred from the claim text.