Sputtering target for magnetic recording medium
AssigneesTanaka Kikinzoku Kogyo K.K., Tohoku University
InventorsTomonari Kamada, Ryousuke Kushibiki, Kim Kong Tham, Shin Saito
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Abstract
For a further high capacity, provided is a sputtering target for a magnetic recording medium that can form a magnetic thin film having enhanced uniaxial magnetic anisotropy, reduced intergranular exchange coupling, and improved thermal stability and SNR (signal-to-noise ratio). The sputtering target for a magnetic recording medium, comprises: a metal phase containing Pt and at least one or more selected from Cu and Ni, with the balance being Co and incidental impurities; and an oxide phase containing at least B2O3.
Claims8
A sputtering target for a magnetic recording medium, comprising:
- a metal phase containing Pt and at least one or more selected from Cu and Ni, with the balance being Co and incidental impurities;
- and an oxide phase containing at least B2O3.
A sputtering target for a magnetic recording medium, comprising:
- a metal phase containing Pt, at least one or more selected from Cu and Ni, and at least one or more selected from Cr, Ru, and B, with the balance being Co and incidental impurities;
- and an oxide phase containing at least B2O3.
Dependencies are inferred from the claim text.