Charged Particle Beam Device
AssigneeHitachi High-Tech Corporation
InventorsMari TAKABATAKE, Kazuyuki HIRAO
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AssigneeHitachi High-Tech Corporation
InventorsMari TAKABATAKE, Kazuyuki HIRAO
Estimating the term…
Provided is a charged particle beam device capable of making a time lag as small as possible when transporting a succeeding wafer from an FOUP to an SC in parallel with returning a preceding wafer from a sample chamber to the FOUP. The charged particle beam device according to the disclosure predicts a completion time point at which a recipe of the preceding wafer is ended, and sets a time point at which the succeeding wafer is started to be taken out from the FOUP so that a timing at which the succeeding wafer is taken out from the FOUP to a load lock chamber and vacuum evacuation of the load lock chamber is completed matches the completion time point.
A charged particle beam device configured to irradiate a sample with a charged
A charged particle beam device configured to irradiate a sample with a charged particle beam, the charged particle beam device comprising:
Dependencies are inferred from the claim text.