Semiconductor memory device
AssigneeSocionext Inc.
InventorYoshinobu YAMAGAMI
Life of this patent
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Abstract
A memory cell of a 2-port static random access memory (SRAM) includes first and second p-type transistors and first to sixth n-type transistors. Gate interconnects extend in the X direction and are arranged in three rows in the Y direction. The gate interconnects in the first row form gates of the first n-type transistor, the first p-type transistor, and the fourth n-type transistor, the gate interconnect in the second row forms gates of the fifth and sixth n-type transistors, and the gate interconnects in the third row form gates of the third n-type transistor, the second n-type transistor, and the second p-type transistor.
Claims3
A semiconductor memory device, comprising:
- a memory cell;
- a first word line extending in a first direction;
- a first bit line pair constituted by a first main bit line and a first sub-bit line extending in a second direction perpendicular to the first direction;
- a second word line extending in the second direction;
- and
- a second bit line pair constituted by a second main bit line and a second sub-bit line extending in the first direction,
- wherein
- the memory cell includes
- a first inverter including a first p-type transistor and a first n-type transistor connected in series, an input of the first inverter being connected with a first node and an output connected with a second node,
- a second inverter including a second p-type transistor and a second n-type transistor connected in series, an input of the second inverter being connected with the second node and an output connected with the first node,
- a third n-type transistor connected between the first main bit line and the first node, having a gate connected with the first word line,
- a fourth n-type transistor connected between the first sub-bit line and the second node, having a gate connected with the first word line,
- a fifth n-type transistor connected between the second main bit line and the first node, having a gate connected with the second word line, and
- a sixth n-type transistor connected between the second sub-bit line and the second node, having a gate connected with the second word line,
- gate interconnects that are to be gates of the first and second p-type transistors and the first to sixth n-type transistors extend in the first direction and are arranged in three rows in the second direction,
- the gate interconnect in the first row forms the gates of the first n-type transistor, the first p-type transistor, and the fourth n-type transistor,
- the gate interconnect in the second row forms the gates of the fifth and sixth n-type transistors, and
- the gate interconnect in the third row forms the gates of the third n-type transistor, the second n-type transistor, and the second p-type transistor.
A semiconductor memory device, comprising:
- a memory cell;
- a first word line extending in a first direction;
- a first bit line pair constituted by a first main bit line and a first sub-bit line extending in a second direction perpendicular to the first direction;
- a second word line;
- and
- a second bit line pair constituted by a second main bit line and a second sub-bit line,
- wherein
- the memory cell includes
- a first inverter including a first p-type transistor and a first n-type transistor connected in series, an input of the first inverter being connected with a first node and an output connected with a second node,
- a second inverter including a second p-type transistor and a second n-type transistor connected in series, an input of the second inverter being connected with the second node and an output connected with the first node,
- a third n-type transistor connected between the first main bit line and the first node, having a gate connected with the first word line,
- a fourth n-type transistor connected between the first sub-bit line and the second node, having a gate connected with the first word line,
- a fifth n-type transistor connected between the second main bit line and the first node, having a gate connected with the second word line, and
- a sixth n-type transistor connected between the second sub-bit line and the second node, having a gate connected with the second word line,
- gate interconnects that are to be gates of the first and second p-type transistors and the first to sixth n-type transistors extend in the first direction and are arranged in three rows in the second direction,
- the gate interconnect in the first row forms the gates of the first n-type transistor, the first p-type transistor, and the fourth n-type transistor,
- the gate interconnect in the second row forms the gates of the fifth and sixth n-type transistors,
- the gate interconnect in the third row forms the gates of the third n-type transistor, the second n-type transistor, and the second p-type transistor, and
- the memory cell is connected with the first word line through a via formed at an end of the memory cell in the first direction, and is connected with the first main bit line and the first sub-bit line through vias formed at ends of the memory cell in the second direction.
A semiconductor memory device, comprising:
- a memory cell;
- a first word line;
- a first bit line pair constituted by a first main bit line and a first sub-bit line;
- a second word line;
- and
- a second bit line pair constituted by a second main bit line and a second sub-bit line,
- wherein
- the memory cell includes
- a first inverter including a first p-type transistor and a first n-type transistor connected in series, an input of the first inverter being connected with a first node and an output connected with a second node,
- a second inverter including a second p-type transistor and a second n-type transistor connected in series, an input of the second inverter being connected with the second node and an output connected with the first node,
- a third n-type transistor connected between the first main bit line and the first node, having a gate connected with the first word line,
- a fourth n-type transistor connected between the first sub-bit line and the second node, having a gate connected with the first word line,
- a fifth n-type transistor connected between the second main bit line and the first node, having a gate connected with the second word line, and
- a sixth n-type transistor connected between the second sub-bit line and the second node, having a gate connected with the second word line,
- gate interconnects that are to be gates of the first and second p-type transistors and the first to sixth n-type transistors extend in a first direction and are arranged in three rows in a second direction perpendicular to the first direction,
- the gate interconnect in the first row forms the gates of the first n-type transistor, the first p-type transistor, and the fourth n-type transistor,
- the gate interconnect in the second row forms the gates of the fifth and sixth n-type transistors,
- the gate interconnect in the third row forms the gates of the third n-type transistor, the second n-type transistor, and the second p-type transistor,
- the fourth n-type transistor is located on a first-hand side in the first direction with respect to the first n-type transistor and the first p-type transistor, and
- the third n-type transistor is located on a second-hand side in the first direction with respect to the second n-type transistor and the second p-type transistor, the second-hand side being the side opposite to the first-hand side.
Dependencies are inferred from the claim text.