Method of verifying optical proximity effect correction

A method of verifying optical proximity effect correction, comprising:

• generating a design pattern layout comprising a target pattern;
• generating a correction pattern layout from the design pattern layout by performing optical proximity effect correction;
• generating a simulation pattern by performing a simulation using the correction pattern layout;
• and
• detecting a defect pattern from the simulation pattern,
• wherein the detecting the defect pattern comprises:
• acquiring position data of a center of gravity of the target pattern;
• acquiring position data of a center of gravity of the simulation pattern;
• and
• determining whether the simulation pattern is the defect pattern using the position data of the center of gravity of the target pattern and the position data of the center of gravity of the simulation pattern.

A method of verifying optical proximity effect correction, comprising:

• generating a design pattern layout comprising a target pattern;
• generating a correction pattern layout from the design pattern layout by performing optical proximity effect correction;
• forming a wafer pattern on a wafer using the correction pattern layout;
• generating a contour image comprising an image pattern corresponding to the wafer pattern;
• and
• detecting a defect pattern from the image pattern of the contour image,
• wherein the detecting the defect pattern comprises:
• setting a defect pattern detection reference;
• acquiring position data of a center of gravity of the image pattern;
• and
• determining whether the wafer pattern is the defect pattern using the defect pattern detection reference and the position data of the center of gravity of the image pattern,
• wherein the acquiring the position data of the center of gravity of the image pattern comprises:
• splitting the image pattern into a plurality of fine patterns;
• collecting position data of a center of gravity of each of the plurality of fine patterns;
• and
• calculating the position data of the center of gravity of the image pattern, the position data (CoM) of the center of gravity of the image pattern being represented by the expression:
• C
• ⁢
• ⁢
• o
• ⁢
• ⁢
• M
• =
• ∑
• r
• →
• i
• ·
• d
• i
• D
• where i is a natural number equal to or greater than 1 and equal to or less than n, n is a natural number equal to or greater than 2, {right arrow over (r)}i is position data of the center of gravity of an ith fine pattern among the plurality of fine patterns, di is an area of an ith fine pattern among the plurality of fine patterns, and D is an entire area of the plurality of fine patterns.