Cell row arrangement in regions of integrated circuit layout

A computer program code stored on a non-transitory computer-readable medium for generating a layout design, the computer program code is configured to cause a system having at least one processor to execute:

• forming a first region having at least two first-type cell rows extending in a first direction, wherein each one of the first-type cell rows has a first row height measured along a second direction perpendicular to the first direction;
• forming a second region having at least two second-type cell rows extending in the first direction, wherein each one of the second-type cell rows has a second row height measured along the second direction;
• forming a third region having at least two third-type cell rows extending in the first direction, wherein each one of the third-type cell rows has a third row height measured along the second direction;
• and
• wherein the first region is adjacent to the second region at a first side and the third region is adjacent to the second region at a second side, wherein the first side and the second side are at opposite ends of the second region;
• and
• wherein the first row height, the second row height, and the third row height are all different from each other.

A method of generating, by a processor, a layout design of an integrated circuit, the method comprising:

• forming a first region having at least two first-type cell rows extending in a first direction;
• forming a second region having at least two second-type cell rows extending in the first direction, wherein the first region is adjacent to the second region along a first separation channel extending in a second direction that is perpendicular to the first direction;
• forming a first group of gate strips having a first contacted poly pitch in each one of the first-type cell rows;
• and
• forming a second group of gate strips having a second contacted poly pitch in each one of the second-type cell rows, wherein the first contacted poly pitch is different from the second contacted poly pitch.