Metrology apparatus with radiation source having multiple broadband outputs

A metrology system for use in a lithographic manufacturing process, the metrology system comprising:

• a radiation source comprising a drive laser having an output split into a plurality of optical paths;
• and
• a plurality of metrology apparatuses comprising
• a respective one of a plurality of optical paths, each comprising a respective broadband light generator, the broadband light generator comprising a gas-filled hollow core photonic crystal fiber configured to generate broadband radiation;
• illumination optics configured to illuminate a structure on a substrate with radiation from the respective broadband light generator;
• a detection system configured to detect scattered radiation, having been scattered by the structure;
• and
• a processor configured to determine a parameter of interest of the structure based on the scattered radiation, wherein the metrology system is configured to output of the drive laser is split in parallel using an optical splitting device or an optical switching device and the respective broadband generators are operable in parallel to provide parallel output of the plurality of metrology apparatuses.