Radiation source supply system for lithographic tools

A method, comprising:

• generating a plurality of laser light beams by a plurality of light sources;
• combining the plurality of laser light beams into a single combined laser light beam;
• directing the single combined laser light beam to a first attenuation unit including a reflector and inlet port, the first attenuation unit connected to a first lithographic tool;
• by the reflector of the first attenuation unit, reflecting a first reflected portion of the single combined laser light beam to the first lithographic tool, the inlet port of the first attenuation unit coupled to an actuator that is operable to move the inlet port of the first attenuation unit;
• by the reflector of the first attenuation unit, transmitting a first transmitted portion of the single combined laser light beam to a second attenuation unit connected to the first attenuation unit, the second attenuation unit including a reflector;
• by the reflector of the second attenuation unit, reflecting a second reflected portion of the first transmitted portion of the single combined laser light beam to a second lithographic tool;
• varying a percentage of the first transmitted portion of the single combined laser light beam reflected by the reflector of the second attenuation unit according to a power level requirement of the second lithographic tool;
• and
• adjusting, by the actuator coupled to the inlet port of the first attenuation unit, an incident angle of the single combined laser light beam relative to the reflector of the first attenuation unit.

An apparatus, comprising:

• a first attenuation unit comprising:
• a first housing having a first inlet port, a first reflection outlet port, and a first transmission outlet port;
• a first reflector disposed in the first housing, wherein the first reflector is positioned to receive a first light beam from the first inlet port, reflect a first reflected portion of the first light beam to the first reflection outlet port, and transmit a first transmitted portion of the first light beam to the first transmission outlet port;
• and
• an actuator coupled to the first inlet port, wherein the actuator is operable to move the first inlet port relative to the first reflector to change an incident angle of the first light beam from the first inlet port relative to a reflecting surface of the first reflector;
• a first lithographic tool;
• and
• a first optical conduit connecting the first reflection outlet port and the first lithographic tool to direct the first reflected portion of the first light beam from the first attenuation unit.